Substrate processing method and substrate processing apparatus

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United States of America Patent

PATENT NO 11511321
APP PUB NO 20200130025A1
SERIAL NO

16662020

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Abstract

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A substrate processing method includes forming a high surface tension liquid film by supplying high surface tension liquid on a substrate surface, replacing the high surface tension liquid film with low surface tension liquid by supplying the low surface tension liquid to a center area of a substrate so that the low surface tension liquid impinges on the high surface tension liquid film formed on the center area of the substrate, and supplying high surface tension liquid for a predetermined period of time during the supplying the low surface tension liquid.

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Patent Owner(s)

  • SEMES CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bang, Byung Sun Hwaseong-si, KR 4 1
Choi, Young Jun Asan-si, KR 40 163
Jung, Bu Young Cheonan-si, KR 9 1
Kim, Young Jin Seoul, KR 241 1774
Oh, Seung Hoon Cheonan-si, KR 84 631
Woo, Jong Hyeon Asan-si, KR 4 2
Yu, Jin Tack Asan-si, KR 6 2

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