Manufacturing method in manufacturing line, manufacturing method for exposure apparatus, and exposure apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 10, 2005
Grant Date -
Jul 4, 2002
app pub date -
Dec 27, 2001
filing date -
Dec 28, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A manufacturing method for exposure apparatuses is provided in which a reticle R1 held on a reticle stage system (RST) is illuminated by exposure light from an exposure light source (16) via the illumination systems (IL1) and (IL2). In a first manufacturing line, a main body module composed of a frame caster (2), a main body support section 3), and a main body column (5) is assembled, and an illumination system and the projection optical system PL are mounted on this main body module. Then a stage module, which is assembled and adjusted using another main body module in a second manufacturing line, is mounted on the main body module of the first manufacturing line. Therefore exposure apparatuses can be efficiently manufactured without using dedicated large scale adjustment jigs.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully