Delivery systems for efficient vaporization of precursor source material
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United States of America Patent
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Oct 14, 2008
Grant Date -
Dec 1, 2005
app pub date -
Jun 21, 2005
filing date -
Jul 23, 2003
priority date (Note) -
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Abstract
A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.
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