Systems and methods for in-situ Marangoni cleaning

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United States of America

PATENT NO 11923210
SERIAL NO

16547428

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Abstract

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In an embodiment, a method includes: immersing a wafer in a bath within a cleaning chamber; removing the wafer out of the bath through a solvent and into a gas within the cleaning chamber; determining a parameter value from the gas; and performing remediation within the cleaning chamber in response to determining that the parameter value is beyond a threshold value.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Wei-Chun Hsin-Chu, TW 55 148
Peng, Chui-Ya Hsinchu, TW 32 29
Wang, Shu-Yen Hsin-Chu, TW 16 16

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