Method and apparatus to improve across field dimensional control in a microlithography tool
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 1, 2000
Grant Date -
N/A
app pub date -
Jun 30, 1998
filing date -
Jun 30, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A technique for improving across field dimensional control in a microlithography tool. In a lithography imaging process in which a pattern on a mask is projected to form latent images in a photosensitive medium, the critical dimension distribution across the imaging field varies due to scattering and other factors. An optical compensator having gradient neutral density filter properties is used to reduce the intensity of light at those locations corresponding to regions of an imaging field having higher exposure dose. By reducing the intensity of light at the higher dose regions, the overall dose profile is made more uniform, which reduces linewidth variations when devices are fabricated on an semiconductor wafer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully