Wet developable bottom antireflective coating composition and method for use thereof
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United States of America Patent
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Jul 21, 2009
Grant Date -
Oct 18, 2007
app pub date -
Apr 18, 2006
filing date -
Apr 18, 2006
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Abstract
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
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