Chemical vaporizer for material deposition systems and associated methods
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United States of America Patent
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Feb 8, 2011
Grant Date -
Feb 5, 2009
app pub date -
Jul 30, 2007
filing date -
Jul 30, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.
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