Extreme ultra violet lithography mask and method for fabricating the same
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United States of America Patent
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May 10, 2011
Grant Date -
Oct 22, 2009
app pub date -
Jun 30, 2008
filing date -
Apr 22, 2008
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for fabricating an extreme ultra violet lithography mask includes forming a reflective layer that reflects an extreme ultra violet light on a substrate; forming a capping layer that transmits the extreme ultra violet light on the reflective layer; and forming selectively pores in some region of the capping layer to form a light absorption region that absorbs the extreme ultra violet light.
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