Apparatus and method for extended plasma confinement

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United States of America Patent

PATENT NO 11758640
APP PUB NO 20220394839A1
SERIAL NO

17841591

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.

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Patent Owner(s)

  • ZAP ENERGY, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Meier, Eric T Seattle, US 5 8
Nelson, Brian A Edmonds, US 13 49
Shumlak, Uri Seattle, US 13 49

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