Positive photosensitive composition

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United States of America Patent

PATENT NO 7514201
APP PUB NO 20070141513A1
SERIAL NO

11698114

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Abstract

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A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujimori, Toru Shizuoka , JP 69 524

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