Slurry for chemical-mechanical polishing of metals and use thereof

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United States of America Patent

PATENT NO 9057004
APP PUB NO 20130078811A1
SERIAL NO

13241383

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Abstract

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A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bates, Graham M Waterbury, US 9 23
Brigham, Michael T Bolton, US 11 31
Comeau, Joseph K Alburgh, US 5 264
Ritter, Jason P Jericho, US 10 21
Shah, Eva A Essex Junction, US 8 23
Tiersch, Matthew T Essex Junction, US 13 50
White, Eric J Charlotte, US 53 616

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