Apparatus and method for controlling exhaust pressure in semiconductor manufacturing
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 25, 2008
Grant Date -
Jul 14, 2005
app pub date -
Jan 11, 2005
filing date -
Jan 12, 2004
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus and method for controlling exhaust produced by a reactive chamber is provided. The apparatus for controlling exhaust may include, for example, a valve body having an exhaust hole for the exhaust to pass through, and may include a first and second valve which regulate the opening and/or the closing of the exhaust hole. A control device may control the operation of the first and second valves based on the internal pressure of the reactive chamber.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully