Substrate treating apparatus
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United States of America Patent
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Jan 22, 2019
Grant Date -
Apr 5, 2018
app pub date -
Dec 6, 2017
filing date -
Sep 2, 2015
priority date (Note) -
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Abstract
A substrate treating apparatus and a method of treating a substrate, the apparatus including a substrate treater that treats a substrate using a chemical solution, the chemical solution including a phosphoric acid aqueous solution and a silicon compound; and a chemical solution supplier that supplies the chemical solution to the substrate treating unit, wherein the chemical solution supplier includes a concentration measurer that measures concentrations of the chemical solutions, the concentration measurer including a first concentration measurer that measures a water concentration of the chemical solution; and a second concentration measurer that measures a silicon concentration of the chemical solution.
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