Self-aligned spacers for multi-gate devices and method of fabrication thereof

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11302825
APP PUB NO 20200052132A1
SERIAL NO

16656367

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Abstract

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A semiconductor device includes a substrate; a channel member above the substrate; a gate structure wrapping the channel member; a source/drain (S/D) feature abutting the channel member; and an inner spacer interposing the S/D feature and the gate structure, wherein a first sidewall of the inner spacer facing the gate structure has a curvature surface in a cross-sectional view perpendicular to a top surface of the substrate and along a lengthwise direction of the channel member.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Guan-Lin Hsinchu County, TW 103 519
Cheng, Kuan-Lun Hsin-Chu, TW 418 895
Ching, Kuo-Cheng Hsinchu County, TW 366 6890
Ju, Shi Ning Hsinchu, TW 164 802
Wang, Chih-Hao Hsinchu County, TW 1018 6870

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