Gas mixer to enable RPS purging

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United States of America Patent

PATENT NO 11862475
SERIAL NO

17071618

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Abstract

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A semiconductor processing system includes a remote plasma source (RPS), a faceplate, and an output manifold positioned between the RPS and the faceplate. The output manifold is characterized by a plurality of purge outlets that are fluidly coupled with a purge gas source and a plurality of deposition outlets that are fluidly coupled with a deposition gas source. A delivery tube extends between and fluidly couples the RPS and the faceplate. The delivery tube is characterized by a generally cylindrical sidewall that defines an upper plurality of apertures that are arranged in a radial pattern. Each of the upper apertures is fluidly coupled with one of the purge outlets. The generally cylindrical sidewall defines a lower plurality of apertures that are arranged in a radial pattern and below the upper plurality of apertures. Each of the lower apertures is fluidly coupled with one of the deposition outlets.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INCP O BOX 450A SANTA CLARA CA 95052

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bansal, Amit Milpitas, US 35 278
Choudhury, Rupankar Agartala, IN 9 31
Kedlaya, Diwakar San Jose, US 30 20
Konnoth, Joseph Job George Kerala, IN 3 0
Mings, Sherry L Sachse, US 2 0
Narayanan, Rajaram Santa Clara, US 5 0
Parimi, Venkata Sharat Chandra Sunnyvale, US 23 4
Ramamurthi, Badri N Los Gatos, US 16 4
Ruan, Fang Milpitas, US 13 1

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