Methods of fabricating ferroelectric devices
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 8, 2009
Issued Date -
N/A
app pub date -
Jul 17, 2007
filing date -
Jul 18, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method of fabricating a ferroelectric device includes forming a ferroelectric layer on a substrate in a reaction chamber. An inactive gas is provided into the reaction chamber while unloading the substrate therefrom to thereby substantially inhibit formation of an impurity layer on the ferroelectric layer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully