System and method for measuring the focus state of an optical instrument

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11237375
APP PUB NO 20190339504A1
SERIAL NO

16473952

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Abstract

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A system and a method for measuring the focus state of an optical instrument are described. The system and the method provide for forming an image of the exit pupil of the objective of the optical instrument. Where the image of the exit pupil is formed, one or more optical elements are placed, deviating at least part of the rays coming from the exit pupil, so that rays coming from different non-overlapping portions of the pupil follow separate optical paths. The rays coming from the two portions of the pupil are then focused, in order to obtain two bidimensional images. A computer determines the mutual distance between these two bidimensional images as a mutual rigid lateral displacement between the two and, based on this distance, determines the corresponding defocus of the optical instrument.

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Patent Owner(s)

  • LABORATORIO EUROPEO DI SPETTROSCOPIE NON LINEARI (LENS); CONSIGLIO NAZIONALE DELLE RICERCHE (CNR)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mullenbroich, Marie Caroline Sesto Fiorentino, IT 1 0
Pavone, Francesco Saverio Florence, IT 3 22
Sacconi, Leonardo Sesto Fiorentino, IT 1 0
Silvestri, Ludovico Sesto Fiorentino, IT 1 0

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