Process for the wet-chemical treatment of disk-shaped workpieces

United States of America Patent

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Sep 19, 1995
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May 11, 1994
filing date
May 13, 1993

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Abstract

A process for the wet-chemical treatment of workpieces, especially of semiconductor wafers, includes exposing the workpieces to a flow of a gassified treatment medium generated by homogeneously dispersing gas bubbles in a liquid.

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SILTRONIC AG

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Romeder, Peter	Burghausen, DE	3	34
Schwab, Gunter	Emmerting, DE	11	51
Stadler, Max	Haiming, DE	2	20

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Process for the wet-chemical treatment of disk-shaped workpieces

Number of patents in Portfolio can not be more than 2000

United States of America Patent

08240986

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PATENT NO	5451267
SERIAL NO	08240986
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08240986

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