Techniques for optical ion beam metrology
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United States of America Patent
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May 25, 2010
Grant Date -
Mar 26, 2009
app pub date -
Sep 21, 2007
filing date -
Sep 21, 2007
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Abstract
Techniques for providing optical ion beam metrology are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for controlling beam density profile, the apparatus may include one or more camera systems to capture at least one image of an ion beam and a control system coupled to the one or more camera systems to control a beam density profile of the ion beam. The control system may further include a dose profiler to provide information to one or more ion implantation components in at least one of a feedback loop and a feedforward loop to improve dose and angle uniformity.
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