Wafer holding robot end effecter vertical position determination in ion implanter system
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United States of America Patent
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Mar 9, 2010
Grant Date -
Sep 11, 2008
app pub date -
Mar 6, 2007
filing date -
Mar 6, 2007
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.
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