Ion beam current monitoring
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United States of America Patent
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-
Mar 11, 2008
Grant Date -
Aug 30, 2007
app pub date -
Feb 24, 2006
filing date -
Feb 24, 2006
priority date (Note) -
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status (Latency Note)
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Abstract
An ion beam monitoring system includes a charge neutralization system and a sensor. The charge neutralization system is configured to provide a compensating current to control a charge on a front surface of a wafer. The sensor is configured to sense the compensating current and provide a sensor signal in response to the compensating current, wherein the sensor signal is representative of a beam current of an ion beam. The charge neutralization system may include a plasma flood gun configured to provide the compensating current to the ion beam.
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