Highly durable silica glass, process for producing same, member comprised thereof, and apparatus provided therewith
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United States of America Patent
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Aug 1, 2006
Grant Date -
Sep 18, 2003
app pub date -
Mar 10, 2003
filing date -
Mar 11, 2002
priority date (Note) -
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Abstract
Highly durable silica glass comprising silica having incorporated therein aluminum and at least one element (M) selected from group 2A elements, group 3A elements and group 4A elements of the periodic table. Preferably, the sum of aluminum and element (M) is at least 30 atomic % based on the amount of total metal elements in the silica glass, and the atomic ratio of aluminum to element (M) is in the range of 0.05 to 20.The silica glass has a high purity and exhibits enhanced durability while good processability and machinability, and reduced dusting property are kept, and the glass is suitable for members of a semiconductor production apparatus or liquid crystal display production apparatus using a halogenated gas and/or its plasma.
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