Cathode unit and film forming apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11581171
APP PUB NO 20210257198A1
SERIAL NO

17172327

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A cathode unit for performing a sputtering film formation includes: a target that emits sputtering particles; a target cooler that includes a cooling plate to which the target is bonded; and a power supply that supplies a power to the target. The target has a high-temperature region that has a higher temperature than other regions of the target during a film formation. The cooling plate includes a coolant flow space through which a coolant flows, and a first wall and a second wall that define the coolant flow space in a thickness direction. In the coolant flow space, a flow path of the coolant is formed by a first partition plate and a second partition plate. The first partition plate does not exist at a portion of the coolant flow space that corresponds to the high-temperature region.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO JAPAN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abarra, Einstein Noel Tokyo, JP 42 172
Shinada, Masato Tokyo, JP 19 9

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