Providing metric data for patterns usable in a modeling environment

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United States of America Patent

PATENT NO 11782682
SERIAL NO

17374806

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Abstract

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Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.

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Patent Owner(s)

Patent OwnerAddress
THE MATHWORKS INC3 APPLE HILL DRIVE NATICK MA 01760

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Biswas, Partha Wayland, US 12 77
Braganza, Sherman Brookline, US 3 1
Gupta, Chirag Karnataka, IN 13 43
Meena, Radhey Shyam Rajasthan, IN 2 0
Pal, Neha West Bengal, IN 2 0
Rajan, Madhav Wayland, US 2 0
Xu, Huanhuan Wellesley, US 5 0

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