System for supplying photoresist and method for fabricating semiconductor device using the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11733616
APP PUB NO 20230115351A1
SERIAL NO

17804732

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Importance

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Abstract

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A photoresist supplying system includes a pump that includes a first tube phragm that stores a photoresist and a filter that filters the photoresist, a second tube phragm that stores the photoresist and is disposed outside the pump, where the second tube phragm transfers the photoresist to the first tube phragm, a storage unit that stores the photoresist, where the storage unit provides the photoresist to the second tube phragm, and a tube phragm drive unit that is connected to the first tube phragm. The tube phragm drive unit adjusts an interior volume of the first tube phragm and applies a pressure to a flexible outer wall of the first tube phragm to transfer the photoresist from the first tube phragm to a nozzle installed in the chamber. At least a part of the photoresist stored in the first tube phragm is transferred to the second tube phragm.

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Patent Owner(s)

  • SAMSUNG ELECTRONICS CO. LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Heo, Seok Hwaseong-si, KR 28 22
Kim, Ho Kyun Hwaseong-si, KR 6 47
Lee, Ju Hyung Cheongju-si, KR 49 436
Lee, Sang Ho Suwon-si, KR 289 2861
Oh, Kyoung Whan Hwaseong-si, KR 7 7
Sasa, Takashi Hwaseong-si, KR 20 166

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