Selective etch process using hydrofluoric acid and ozone gases

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United States of America Patent

PATENT NO 11791166
SERIAL NO

17532143

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Abstract

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Systems and methods for etching titanium containing layers on a workpiece are provided. In one example, a method includes placing the workpiece on a workpiece support in a processing chamber. The workpiece includes a first layer and a second layer. The first layer is a titanium containing layer. The method includes admitting a process gas into the processing chamber. The process gas includes an ozone gas and a fluorine containing gas. The method includes exposing the first layer and the second layer on the workpiece to the process gas to at least partially etch the first layer at a greater etch rate relative to the second layer.

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Patent Owner(s)

  • BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD; MATTSON TECHNOLOGY, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chung, Hua Saratoga, US 201 12629
Xie, Ting Fremont, US 35 168
Yang, Haichun San Jose, US 20 1427
Yang, Michael X Palo Alto, US 129 7131
Zhang, Qi San Jose, US 706 5322

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