Purification system and method
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United States of America Patent
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May 10, 2005
Grant Date -
Mar 6, 2003
app pub date -
Sep 4, 2001
filing date -
Sep 4, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A system for use with a plating cell configured to plate objects in a plating process. At least one byproduct is created in a plating substance used in the plating cell. The system includes a purification system configured to remove at least a portion of the at least one byproduct from the plating substance. The purification system comprises at least a first processing vessel, a second processing vessel, and a flow path providing flow from the first processing vessel to the second processing vessel. The flow path may be configured such that the flow from the first vessel to the second vessel is caused by gravity. A method is also provided for removing at least a portion of at least one byproduct from a plating substance used in a plating cell.
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