Method for producing frame-equipped vapor deposition mask, stretching apparatus, apparatus for producing organic semiconductor device and method for producing organic semiconductor device

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United States of America Patent

PATENT NO 10043974
APP PUB NO 20160301006A1
SERIAL NO

15188111

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.

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Patent Owner(s)

  • DAI NIPPON PRINTING CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honma, Yoshiyuki Tokyo, JP 5 24
Obata, Katsunari Tokyo, JP 64 435
Okamoto, Hideyuki Tokyo, JP 42 117
Takeda, Toshihiko Tokyo, JP 176 2669

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