Wafer cleaning system and method

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United States of America Patent

PATENT NO 11742227
APP PUB NO 20200135516A1
SERIAL NO

16725459

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Abstract

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A wafer cleaning system and method are provided. A brush element is configured to clean a backside of the wafer. The backside has a clear area and an unclear area, and some contaminants are located in the unclear area. A control device performs a first cleaning process to the brush element when the brush element is located at the clear area, and the control device performs a second cleaning process when the brush element is located at the unclear area. The contaminants are cleaned by an enhanced cleaning process. Since the contaminants are cleaned, the backside of the wafer is flatter, and quality of the exposed photoresist on the wafer is improved.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, You-Feng Taichung, TW 6 8
Shang, Yao-Yuan Taichung, TW 9 14
Tseng, Kuo-Shu New Taipei, TW 33 399

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