Self-assembled nano-lithographic imprint masks

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United States of America Patent

PATENT NO 8178011
APP PUB NO 20110024950A1
SERIAL NO

12511457

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Abstract

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The present disclosure relates to techniques for replicating large-scale nano-pattern structures using a block copolymer structure as a mask in a replication process. Example methods may include performing self-assembling block copolymer reactions to create large self-assembling nano-structures. The nano-structures may then be replicated by using the large self-assembling nano-structure as a mask in nano-imprint lithography.

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Patent Owner(s)

  • EMPIRE TECHNOLOGY DEVELOPMENT LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kruglick, Ezekiel Poway, US 328 4214

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