Diffusion reactor with sloped bottom plate suitable for cleaning the same
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United States of America Patent
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-
Mar 25, 2003
Grant Date -
N/A
app pub date -
Sep 15, 2000
filing date -
Sep 16, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A cleaning system for a reaction chamber having jigs and top and bottom openings includes a cleaning solution supplier under the top opening for spraying a cleaning solution within the reaction chamber to supply the cleaning solution onto an inner wall of the reaction chamber and surfaces of the jigs, and a sloped bottom plate that closes the bottom opening so that the cleaning solution falls onto the sloped bottom plate and flows across the sloped bottom plate to a drain.
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