Apparatus for making a polishing pad with a partial adhesive coating
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 6, 2004
Grant Date -
Dec 27, 2001
app pub date -
Aug 14, 2001
filing date -
Dec 9, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method for selectively altering a polishing pad adhesive layer includes providing a mask having transparent regions and opaque regions and directing radiation toward the mask so that the radiation passes through the transparent regions and impinges onto the adhesive layer on the polishing pad. The area of the adhesive layer corresponding to the transparent regions of the mask is cured to be less adhesive. The area of the adhesive layer corresponding to the opaque regions remain adhesive.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully