Dual resistance heater for phase change memory devices
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United States of America Patent
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Dec 31, 2019
Grant Date -
Jul 2, 2015
app pub date -
Feb 6, 2015
filing date -
Dec 30, 2004
priority date (Note) -
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status (Latency Note)
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Abstract
In various examples, a dual resistance heater for a phase change material region is fabricated by forming a resistive material. Prior to forming the phase change material region over the resistive material, at least an upper portion of the resistive material is exposed to an implantation or plasma that increases the resistance of an upper portion of the resistive material relative to the remainder, or bulk, of the resistive material. As a result, the portion of the resistive material proximate to the phase change material region forms a heater because of its high resistance value, but the bulk of the resistive material has a relatively lower resistance value and, thus, does not increase the voltage drop and current usage of the device. Other methods and devices are disclosed.
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