Method, structure, and apparatus for Raman spectroscopy

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United States of America Patent

PATENT NO 7894056
APP PUB NO 20100085565A1
SERIAL NO

12584898

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Disclosed herein are a Raman spectroscopy structure comprising a porous material substrate, and a method of performing Raman spectroscopy of a sample disposed adjacent to the structure comprising the porous material substrate. Generally, the substrate includes one or more layers of a porous material such as porous silicon, porous polysilicon, porous ceramics, porous silica, porous alumina, porous silicon-germanium, porous germanium, porous gallium arsenide, porous gallium phosphide, porous zinc oxide, and porous silicon carbide. It has been discovered that such a substrate material, when excited with near-infrared light, does not exhibit undesired background fluorescence characteristic of other known Raman spectroscopy substrates.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Koo, Tae-Woong T San Francisco, US 3 9
Yamakawa, Mineo Campbell, US 93 1957

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