Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens

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United States of America Patent

PATENT NO 8796620
APP PUB NO 20120312984A1
SERIAL NO

13155890

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Abstract

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Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.

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Patent Owner(s)

  • MKS INSTRUMENTS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Batey, Jonathan Hugh Frodsham, GB 5 9
Shaw, Philip Neil Warrington, GB 6 23

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