Method of varying etch selectivities of a film
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United States of America Patent
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Jul 24, 2007
Grant Date -
Jul 7, 2005
app pub date -
Dec 30, 2003
filing date -
Dec 30, 2003
priority date (Note) -
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Abstract
A method of patterning a crystalline film. A crystalline film having a degenerate lattice comprising first atoms in a first region and a second region is provided. Dopants are substituted for said first atoms in said first region to form a non-degenerate crystalline film in said first region. The first region and the second region are exposed to a wet etchant wherein the wet etchant etches the degenerate lattice in said second region without etching the non-degenerate lattice in the first region.
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