External ion injection apparatus for a cyclotron

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United States of America Patent

PATENT NO 4937531
SERIAL NO

07241307

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The external ion injection apparatus for a cyclotron is improved so as to be applicable to a small-sized cyclotron and yet capable of accelerating a large-intensity ion beam. The improvements reside in the provision of an ion source disposed externally of a cyclotron, a first D.C. high voltage generator coupled to the ion source for generating a first D.C. high voltage to inject ions produced by the ion source as an incident ion beam with a predetermined acceleration into the cyclotron along a magnetic midplane thereof, a second D.C. high voltage generator for generating a second D.C. high voltage of the same polarity as the first D.C. high voltage, and a beam guiding electrode group arranged within the cyclotron and applied with the second D.C. high voltage for leading the incident ion beam towards the central portion of the magnetic poles of the cyclotron along a repeated semicircle orbit.

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Patent Owner(s)

  • SUMITOMO HEAVY INDUSTRIES, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Odera, Masatoshi Tokyo, JP 1 2

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