Focus ring replacement method and plasma processing system

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11990323
APP PUB NO 20200035471A1
SERIAL NO

16594422

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method performed by a processor of a plasma processing system including a transfer device and a plasma processing apparatus that includes a process chamber. The process chamber includes a mount table on a surface of which a first focus ring is placed. The method includes controlling the transfer device to transfer the first focus ring out of the process chamber without opening the process chamber to the atmosphere; after the first focus ring is transferred out of the process chamber, controlling the plasma processing apparatus to clean the surface of the mount table; and after the surface of the mount table is cleaned, controlling the transfer device to transfer a second focus ring into the process chamber and place the second focus ring on the surface of the mount table without opening the process chamber to the atmosphere.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishizawa, Shigeru Miyagi, JP 29 1585

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