Semiconductor device and method of manufacture

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11942549
APP PUB NO 20230103640A1
SERIAL NO

18064562

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Abstract

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A semiconductor device and method of manufacture are provided. In embodiments a first liner is deposited to line a recess between a first semiconductor fin and a second semiconductor fin, the first liner comprising a first material. The first liner is annealed to transform the first material to a second material. A second liner is deposited to line the recess, the second liner comprising a third material. The second liner is annealed to transform the third material to a fourth material.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chui, Chi On Hsinchu, TW 390 975
Kao, Wan-Yi Baoshan Township, TW 62 92
Lu, Yung-Cheng Hsinchu, TW 159 2349
Peng, Chih-Tang Zhubei, TW 69 648
Shiau, Yu-Cheng Hsinchu, TW 6 7
Wang, Chunyao Zhubei, TW 37 43

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