Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor

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United States of America Patent

PATENT NO 8753474
APP PUB NO 20110073564A1
SERIAL NO

12878582

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Abstract

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Embodiments of the present invention relate to method and apparatus for providing processing gases to a process chamber with improved plasma dissociation efficiency. One embodiment of the present invention provides a baffle nozzle assembly comprising an outer body defining an extension volume connected to a processing chamber. A processing gas is flown to the processing chamber through the extension volume which is exposed to power source for plasma generation.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Farr, Jon C Vallejo, US 8 48
Kumar, Ajay Cupertino, US 489 10777
Nangoy, Roy C Santa Clara, US 25 280
Pamarthy, Sharma V Fremont, US 10 85
Singh, Saravjeet Santa Clara, US 75 1917

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