Apparatus for processing substrate and operating method thereof

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11938493
APP PUB NO 20210039119A1
SERIAL NO

16985535

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a substrate processing apparatus. The substrate processing apparatus includes a swing nozzle that is arranged on one side of the support module, moves in a swing manner, and sprays a chemical solution to the substrate, a sensor arranged on one side of the swing nozzle to sense movement of the swing nozzle, an electromagnet and a magnet installed on the other side of the swing nozzle so as to be able to adjust spacing relative to each other, and a controller for receiving a sensing result of the sensor and performing a damping operation to the swing nozzle by providing power to the electromagnet to generate an attractive force or repulsive force between the electromagnet and the magnet.

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Patent Owner(s)

  • SEMES CO., LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kang, Han Seon Gyeonggi-do, KR 2 0
Myoung, Noh Hoon Seoul, KR 3 0
Yoon, Jung Min Daegu, KR 22 46

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