Nitrogen-free dielectric anti-reflective coating and hardmask
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 12, 2006
Issued Date -
N/A
app pub date -
Jul 11, 2002
filing date -
Jul 11, 2002
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Methods are provided for depositing a dielectric material. The dielectric material may be used for an anti-reflective coating or as a hardmask. In one aspect, a method is provided for processing a substrate including introducing a processing gas comprising a silane-based compound and an organosilicon compound to the processing chamber and reacting the processing gas to deposit a nitrogen-free dielectric material on the substrate. The dielectric material comprises silicon and oxygen.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully