Ultra-violet lithographic resist composition and process

United States of America Patent

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Jul 13, 1982
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N/A
app pub date
Oct 24, 1980
filing date
Jun 18, 1979

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Expired

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Abstract

Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.

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INTERNATIONAL BUSINESS MACHINES CORPORATION

International Classification(s)

G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....

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Inventor Name	Address	# of filed Patents	Total Citations
Balanson, Richard D	Morgan Hill, CA	2	36
Clecak, Nicholas J	San Jose, CA	7	132
Grant, Barbara D	San Jose, CA	7	129
Ouano, Augustus C	Santa Cruz, CA	4	92

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Ultra-violet lithographic resist composition and process

Number of patents in Portfolio can not be more than 2000

United States of America Patent

06200296

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PATENT NO	4339522
SERIAL NO	06200296
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06200296

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