Plasma processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11664198
APP PUB NO 20200312634A1
SERIAL NO

16831032

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A plasma processing apparatus includes a conductive mounting table, a conductive member, and a first insulating member. The conductive mounting table has a mounting portion on which a substrate is mounted and a stepped portion positioned lower than the mounting portion. The conductive member is disposed on the stepped portion and extends outward over an outer periphery of the mounting table. Further, a first insulating member is disposed on or above an upper surface of the conductive member.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hanaoka, Hidetoshi Miyagi, JP 29 738
Ohta, Hirofumi Miyagi, JP 13 48
Suzuki, Ayuta Yamanashi, JP 12 14

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