Pattern data density inspection apparatus and density inspection method and recording medium storing pattern data density inspection program

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United States of America Patent

PATENT NO 6505325
SERIAL NO

09615450

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A pattern density inspection apparatus is provided which improves the detection accuracy of a pattern data density error region, and outputs detection results for a designer to efficiently perform a correction operation without performing detection of pattern data density error regions which do not require correction. A control section 1 reads out layout data from a layout storage section 2, and stores this in an input processing section 3 and an output processing section 7. A data density computation processing section 4, while displacing layout data of the input processing section 3 from a position where pattern data was computed immediately before, in either one of an X axis direction and a Y axis direction, performs computations of the pattern density in the detection range after movement, and judges if the pattern data density is above 50%, and makes that above 50% a temporary error region. An error overlap removal processing section 5 takes a logical sum of temporary error regions, and creates an aggregate temporary error region. An error region width computation processing section 6 judges if an aggregate temporary error region is an error shape which contains a 400 .mu.m square error judgment reference shape.

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Patent Owner(s)

  • NEC ELECTRONICS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hamamoto, Takeshi Tokyo, JP 117 2571

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