Cleaning solution for semiconductor substrate
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United States of America Patent
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Dec 25, 2007
Grant Date -
Aug 19, 2004
app pub date -
Jan 5, 2004
filing date -
Jan 10, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A cleaning solution for semiconductor substrates comprising a nonionic surface active agent of the formula (1) and/or the formula (2), a chelating agent and a chelating accelerator: CH.sub.3--(CH.sub.2).sub.l--O--(C.sub.mH.sub.2mO).sub.n--X (1) wherein l, m and n independently represent a positive number, and X represents a hydrogen atom or a hydrocarbon group; CH.sub.3--(CH.sub.2).sub.a--O--(C.sub.bH.sub.2bO).sub.d--(C.sub.xH.sub.2x-O).sub.y--X (2) wherein a, b, d, x and y independently represent a positive number, b and x are different, and X represents a hydrogen atom or a hydrocarbon group.
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