Method of manufacturing a mask blank and a mask, the mask blank and the mask, and useless film removing method and apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 5, 2007
Grant Date -
Apr 24, 2003
app pub date -
Sep 27, 2002
filing date -
Sep 28, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
In a method of removing a useless film formed along a circumferential portion of a substrate, so as to provide a removed portion, a cover member is covered over the substrate to supply a solvent to the useless portion through solvent supply holes. The circumferential portion which has the removed portion and a non-removed portion serves to provide an identification code or the like for identifying the substrate. The solvent supply holes are formed in a solvent guide member which is exchangeably attached to a peripheral portion of the cover member. The substrate may be either a mask blank or a mask that has the identification pattern formed by removing the useless film by the above-mentioned method.
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