Lithographic apparatus, calibration method, device manufacturing method and computer program product

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Mar 10, 2009
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Aug 9, 2007
app pub date
Feb 7, 2006
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Feb 7, 2006

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Abstract

Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor.

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ASML NETHERLANDS B.V.

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G02B:OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

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Inventor Name	Address	# of filed Patents	Total Citations
Hauschild, Jan	Eindhoven , NL	7	38
Hofmans, Gerardus Carolus Johannus	Eindhoven, NL	9	82
Kattouw, Hans Erik	Nijmegen, NL	4	13
Oesterholt, Rene	's-hertogenbosch , NL	10	877
Tempelaars, Jeffrey Godefridus Cornelis	Eindhoven, NL	1	12

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Lithographic apparatus, calibration method, device manufacturing method and computer program product

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United States of America Patent

11348530

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PATENT NO	7502096
APP PUB NO	20070181827A1
SERIAL NO	11348530
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
March 10, 2009	US,7502096,B2 US7502096B2	GRANTED PATENT AS SECOND PUBLICATION
August 09, 2007	US,20070181827,A1 US20070181827A1	FIRST PUBLISHED PATENT APPLICATION

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11348530

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