Capacitor array structure and method for forming the same

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United States of America Patent

PATENT NO 11925012
APP PUB NO 20220320095A1
SERIAL NO

17310416

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Abstract

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A method for forming a capacitor array structure includes the following steps: providing a substrate, a capacitor contact being exposed on a surface of the substrate, and the substrate including an array region and a peripheral region; forming a bottom supporting layer covering the substrate and the capacitor contact, the bottom supporting layer having a gap therein; forming a filling layer filling the gap and covering the capacitor contact and the surface of the bottom supporting layer, a thickness of the filling layer located at the peripheral region being larger than that of the filling layer located at the array region; forming supporting layers and sacrificial layers alternately stacked in a direction perpendicular to the substrate; forming a capacitor hole; sequentially forming a lower electrode layer on an inner wall of the capacitor hole.

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Patent Owner(s)

  • CHANGXIN MEMORY TECHNOLOGIES, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hu, Wenjia Hefei, CN 2 0
Sheng, Chaojun Hefei, CN 4 0

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