Method of removing contamination adhered to surfaces and apparatus used therefor
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United States of America Patent
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Mar 2, 2004
Grant Date -
N/A
app pub date -
Oct 2, 2000
filing date -
Sep 30, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of removing surface-deposited contaminants, comprising bringing an ozone-containing treating solution into contact with the surface of a treating target on which contaminants have deposited. The ozone-containing treating solution comprises an organic solvent having a partition coefficient to ozone in a gas, of 0.6 or more, and ozone having been dissolved in the solvent. Contaminants having deposited on the surfaces of various articles including substrates for electronic devices, such as semiconductor substrates and substrates for liquid crystal display devices can be removed by room-temperature and short-time treatment in a high safety and a good efficiency.
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